Generalized predictive control of temperature on an atomic layer deposition reactor

Title: Generalized predictive control of temperature on an atomic layer deposition reactor
Creator: He, Wen-Jie; Zhang, Hai-Tao; Chen, Zhiyong; Chu, Bo; Cao, Kun; Shan, Bin; Chen, Rong
Relation: IEEE Transactions on Control Systems Technology Vol. 23, Issue 6, p. 2408-2415
Publisher Link: http://dx.doi.org/10.1109/TCST.2015.2404898
Publisher: Institute of Electrical and Electronics Engineers (IEEE)
Resource Type: journal article
Date: 2015
Description: This brief establishes a closed-loop control system for a radiant heating atomic layer deposition (ALD) reactor using generalized predictive control (GPC). The GPC-based closed-loop control system can rapidly and precisely stabilize the temperature in the presence of external disturbances. Compared with the conventional open-loop control and the proportional-integral-differential control, the closed-loop GPC system enhances the processing efficiency between every ALD run by substantially reducing settling time with impact by external disturbances. The attenuated temperature fluctuation leads to more uniform thin-film morphologies that fulfill the technical requirements of ALD processes.
Subject: atomic layer deposition; external disturbance; nanometer thin film; predictive control; temperature control
Identifier: http://hdl.handle.net/1959.13/1329593
Identifier: uon:26197
Identifier: ISSN:1063-6536
Language: eng
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